We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Analysis software.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

Analysis software×ペガサスソフトウェア - List of Manufacturers, Suppliers, Companies and Products

Analysis software Product List

1～4 item / All 4 items

Displayed results
Sputtering Simulation Module (SPUTSM)

Sputtering Simulation Module (SPUTSM)

It is possible to perform sputtering analysis with more realistic input data!

The "Sputtering Simulation Module (SPUTSM)" refers to the calculation results of the PIC-MCCM (flux, energy, and incident angle of ions incident on the target) and uses SASAMAL to calculate the emission flux, angular distribution, and energy of sputtered particles. It can utilize the data of incident ions calculated by the PIC-MCCM, which incorporates a particle method for plasma analysis, allowing for sputtering analysis with more realistic input data. Additionally, the input method is simple, requiring only the specification of a data folder for easy incorporation. 【Features】 ■ Calculates the emission flux, angular distribution, and energy of sputtered particles ■ Can use the data of incident ions calculated by the PIC-MCCM, which incorporates a particle method for plasma analysis, as input data ■ Enables sputtering analysis with more realistic input data ■ The input method is easy, requiring only the specification of a data folder for incorporation *For more details, please refer to the PDF materials or feel free to contact us.

  • simulator
  • Other analyses

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Plasma PIC Monte Carlo Collision Module (PIC-MCCM)

Plasma PIC Monte Carlo Collision Module (PIC-MCCM)

High calculation accuracy! A module that excels in plasma analysis when the plasma density inside the device is relatively low.

The "Plasma PIC Monte Carlo Collision Module (PIC-MCCM)" is a module that can analyze the behavior of non-equilibrium low-temperature plasma within devices such as plasma CVD systems, plasma etching systems, sputtering systems, and manufacturing equipment for functional thin films. It specializes in plasma analysis when the plasma density within the device is relatively low (below approximately 10^16 [#/m3]; about 10^10 [#/cc]), and it is also capable of analyzing the behavior of charged particles, such as trajectory analysis of electron beams and ion beams in electromagnetic fields. 【Features】 ■ The physical model is relatively simple. ■ There are few assumptions and approximations in the physical model brought into the simulation. ■ The calculation accuracy is high. ■ Coupling with SMCM allows for coupled simulations that take into account the effects of buffer gas and radical species. *For more details, please refer to the PDF materials or feel free to contact us.

  • simulator
  • Other analyses

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Neutral Particle DSMC Module (DSMCM)

Neutral Particle DSMC Module (DSMCM)

By specifying the new collision calculation method, it is possible to perform calculations with cell sizes greater than the mean free path!

The "Neutral Particle DSMC Module (DSMCM)" is a module that uses the DSMC method (Discrete Simulation of Macroscopic Systems), which involves placing a large number of sample particles and probabilistically triggering collisions among them according to a physical model to track their behavior. It is designed to analyze the flow fields of rarefied gases within various vacuum devices. It is capable of analyzing the behavior of neutral particles (buffer gas, radical species, sputtering particles) that carry no charge within etching devices, thin film manufacturing equipment, and sputtering devices. Additionally, by specifying a new collision calculation method, it can also analyze viscous flow regions (Kn < 0.01). 【Features】 - In principle, it can analyze flow fields from free molecular flow to gas flow at atmospheric pressure. - Due to computational volume issues, it is effective for applying to low-pressure flow fields. - By specifying a new collision calculation method (U-system), calculations can be performed with cell sizes larger than the mean free path. - By coupling with PIC-MCCM or PHM, the behavior of radical species and sputtering particles can also be calculated rapidly using the test particle Monte Carlo method. *For more details, please refer to the PDF document or feel free to contact us.*

  • simulator
  • Other analyses

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
3D Rarefied Gas Behavior Analysis Software 'RGS3D'

3D Rarefied Gas Behavior Analysis Software 'RGS3D'

Introducing software that calculates the density, temperature, and pressure distribution of neutral particles using the DSMC method!

"RGS3D" is a module that uses the DSMC method (particle model) to analyze the flow field of rarefied gases in various vacuum devices. It excels in analyzing flow fields when the Knudsen number (Kn; a dimensionless number that evaluates the rarefaction of the flow, Kn = mean free path / representative length of the flow) exceeds the application limits of the Navier-Stokes equations, specifically for Kn > 0.01. Additionally, when Kn > 1, a fast Monte Carlo method can be selected. 【Features】 ■ Analyzes the behavior of neutral particles without charge under general rarefied gas conditions ■ Enables analysis of viscous flow regions by specifying a new collision calculation method ■ Capable of analyzing structures of arbitrary shapes and spatial mesh divisions ■ Provides accurate analysis for any mixed gas ■ When collisions with walls are dominant, a fast Monte Carlo method can be selected *For more details, please refer to the PDF document or feel free to contact us.

  • Other analyses

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

Search Keywords Related to Analysis software

COPYRIGHT © 2001-2025 IPROS CORPORATION ALL RIGHTS RESERVED.